Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology download epub
Par harwell walter le jeudi, février 22 2018, 06:16 - Lien permanent
Christopher Borst,William N. Gill,Ronald J. Gutmann: Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology
____________________________
Author: Christopher Borst,William N. Gill,Ronald J. Gutmann
Number of Pages: 229 pages
Published Date: 23 Feb 2014
Publisher: Springer-Verlag New York Inc.
Publication Country: New York, NY, United States
Language: English
ISBN: 9781461354246
Download Link: Click Here
____________________________